Deutsch Evern, Germany

Markus Mencke

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Mwo Gesellschaft Zur Herstellung Von Chemisch-Technischen Produkten Mbh. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Mencke. Retrieved from https://idiyas.com/inventor/markus-mencke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovations of Markus Mencke

Introduction

Markus Mencke is an accomplished inventor based in Deutsch Evern, Germany. He has made significant contributions to the field of materials science, particularly in the development of filling materials for optical waveguides. His innovative approach combines polyoxyalkylenes and surfactants to create materials that enhance the performance of polyolefin plastics.

Latest Patents

Markus Mencke holds 1 patent for his work on filling materials. This patent focuses on the preparation of filling materials that are particularly well-suited for optical waveguides, which are essential components in modern communication technologies.

Career Highlights

Throughout his career, Mencke has worked with notable companies such as MWO Gesellschaft zur Herstellung von Chemisch-technischen Produkten mbH and Evonik Hanse GmbH. His experience in these organizations has allowed him to refine his expertise in chemical products and materials engineering.

Collaborations

Mencke has collaborated with esteemed colleagues, including Wilfried Poppe and Hermann Block. These partnerships have contributed to the advancement of his research and the successful development of innovative materials.

Conclusion

Markus Mencke's contributions to the field of materials science, particularly in the area of filling materials for optical waveguides, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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