Espoo, Finland

Markus Laukkanen

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Pibond Oy. Active years: 2026.

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Innovations of Markus Laukkanen in Semiconductor Coatings

Introduction

Markus Laukkanen is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of semiconductor coatings, holding 2 patents that showcase his innovative approach to material science.

Latest Patents

Laukkanen's latest patents include "Silanol-containing organic-inorganic hybrid coatings for high resolution patterning" and "Functional hydrogen silsesquioxane resins and the use thereof." The first patent describes a method for producing coatings on semiconductor substrates using metal and silanol-containing polyhydridosilsesquioxane resin solutions. This method allows for the formation of patterns through selective irradiation and development of the coated substrate. The second patent focuses on coatings that contain carbon-carbon unsaturated bonds, halogens, and solubility enhancers, which are also applied to semiconductor substrates for patterning.

Career Highlights

Markus Laukkanen is currently employed at Pibond Oy, where he continues to advance his research in semiconductor technologies. His work has been instrumental in developing highly sensitive coatings suitable for extreme ultraviolet (EUV) applications.

Collaborations

Laukkanen collaborates with talented individuals such as Luong Dang Nguyen and Kimmo Karaste, contributing to a dynamic research environment that fosters innovation.

Conclusion

Markus Laukkanen's contributions to semiconductor coatings reflect his expertise and commitment to advancing technology in this field. His patents demonstrate a blend of creativity and scientific rigor that is essential for future innovations.

Profile summary based on public USPTO records.
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