Höflein, Austria

Markus Kuhnle

This inventor holds 1 USPTO granted patent. Top assignee: Dentsply Sirona Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Kuhnle. Retrieved from https://idiyas.com/inventor/markus-kuhnle-2khx1ldj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations by Markus Kuhnle in Additive Manufacturing

Introduction

Markus Kuhnle is an innovative inventor based in Hoflein an der Donau, Austria. He has made significant contributions to the field of additive manufacturing, particularly with his patented technology that enhances the efficiency and functionality of manufacturing devices.

Latest Patents

Kuhnle holds a patent for a "Material unit for an additive manufacturing device." This invention features a resin vat that includes a base which is transparent at least in sections. The design connects the resin vat to a holder for a reservoir, allowing resin to flow from the outlet of the reservoir into the vat. This innovation is crucial for improving the additive manufacturing process.

Career Highlights

Markus Kuhnle is currently employed at Dentsply Sirona Inc., a leading company in dental technology. His work focuses on developing advanced manufacturing solutions that cater to the needs of the dental industry. With 1 patent to his name, Kuhnle has established himself as a key player in the field.

Collaborations

Kuhnle collaborates with talented professionals such as Christian Schmidt and Thomas Hasenzahl. Their combined expertise contributes to the advancement of innovative solutions in additive manufacturing.

Conclusion

Markus Kuhnle's contributions to additive manufacturing demonstrate his commitment to innovation and excellence in technology. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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