Waldkirch, Germany

Markus Hammes

This inventor holds 25 USPTO granted patents and 21 published patent applications and 34 EPO patents, primarily in Optoelectronic Safety Systems. Top assignee: Sick Ag. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Hammes. Retrieved from https://idiyas.com/inventor/markus-hammes-fkakjmw6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 88.0

 

Average Co-Inventor Count = 1.8

ph-index = 4

Forward Citations = 59(Granted Patents)


Location History:

  • Freiburg, DE (2011 - 2021)
  • Waldkirch, DE (2016 - 2024)

Company Filing History:


Years Active: 2011-2026

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Areas of Expertise:
Optoelectronic Sensor
Safety System
Object Detection
3D Sensor
Laser Scanner
Distance Measuring Sensor
Crosstalk
Monitoring
Localization
Safety Laser Scanner
Optical Detection
Surrounding Security
25 patents (USPTO):Explore Patents

Title: Markus Hammes - Innovative Inventor from Waldkirch

Introduction: Markus Hammes is a renowned inventor hailing from Waldkirch, Germany, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Markus Hammes holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With over two decades of experience in the industry, Markus Hammes has worked with leading tech companies to develop cutting-edge solutions that have revolutionized various sectors.

Collaborations: Throughout his career, Markus Hammes has collaborated with top researchers, engineers, and scientists to bring his innovative ideas to life, leading to successful partnerships and game-changing inventions.

Conclusion: Markus Hammes continues to inspire the next generation of inventors with his passion for innovation and his dedication to pushing the boundaries of what is possible in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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