Inventors with similar research interests:
Location History:
- Uster, CH (2003 - 2019)
- Zürich, CH (2013 - 2023)
Company Filing History:
40 out of 2,771 
8 out of 1,631 
6 out of 5,442 
Years Active: 2003-2023
Areas of Expertise:
Title: Innovations by Markus H. Gross: A Pioneer in Synthetic Skin Technology
Introduction
Markus H. Gross, located in Uster, Switzerland, is an influential inventor with a remarkable portfolio of 52 patents. His work primarily focuses on advancements in synthetic materials and image processing, making significant strides in technology through innovative methods and applications.
Latest Patents
Among his latest patents, the concept of **Physical Face Cloning** stands out. This patent presents a computer-implemented method to generate synthetic skin through modeling it as an elastic material with isotropic and homogeneous properties, like silicone rubber. The approach utilizes expressive poses captured from a human subject to create a computational model based on various material parameters. It incorporates a compressible neo-Hookean material model designed to simulate the deformation behavior of synthetic skin. This patent also outlines an optimization process that adjusts the thickness of the synthetic skin by minimizing elastic energy, ensuring a realistic representation of facial expressions.
Another significant innovation is the **Adaptive Polynomial Rendering**. This method enhances image quality through adaptive image filtering, employing different approximation functions for various sections of an image. By strategically applying polynomial functions of a specific order, this approach facilitates improved image value estimation and reduces reconstruction errors.
Career Highlights
Throughout his career, Markus H. Gross has collaborated with notable organizations, including Disney Enterprises and Mitsubishi Electric Research Laboratories. His innovative contributions in these esteemed companies have further solidified his reputation as a leading expert in the field.
Collaborations
Gross has worked alongside talented professionals such as Hanspeter Pfister and Robert Walker Sumner. These collaborations have fostered a creative environment that promotes the exchange of ideas and advancements in technology, ultimately leading to breakthroughs in synthetic materials and imaging techniques.
Conclusion
Markus H. Gross continues to influence the technology landscape through his remarkable inventions and collaborations. With a strong focus on enhancing both synthetic skin and image processing capabilities, his contributions are paving the way for future innovations in various industries.