Columbus, OH, United States of America

Markus Bonn

This inventor holds 1 USPTO granted patent. Top assignee: Autodesk, Inc.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Bonn. Retrieved from https://idiyas.com/inventor/markus-bonn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Markus Bonn

Introduction

Markus Bonn is an accomplished inventor based in Columbus, Ohio. He has made significant contributions to the field of thermal zone generation, showcasing his expertise through his innovative patent.

Latest Patents

Markus holds a patent for "Generating thermal zones - Methods, systems, and apparatus, including computer programs encoded on a storage medium, for generating thermal zones." This patent outlines a method that includes identifying a perimeter zone for a first portion of a conceptual representation of a building. It further details the process of dividing the perimeter zone into multiple thermal zones by determining candidate thermal zones based on specific thresholds.

Career Highlights

Markus is currently employed at Autodesk, Inc., where he applies his skills and knowledge to advance the company's technological capabilities. His work focuses on enhancing building design and energy efficiency through innovative thermal zone solutions.

Collaborations

Some of Markus's notable coworkers include Lillian M. Smith and John T. Kennedy, who contribute to the collaborative environment at Autodesk, Inc.

Conclusion

Markus Bonn's innovative work in generating thermal zones exemplifies his commitment to advancing technology in building design. His contributions are valuable to the field and reflect his dedication as an inventor.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…