Goessweinstein, Germany

Markus Baehr

This inventor holds 1 USPTO granted patent. Top assignee: Diehl Defence Gmbh & Co. Kg. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Baehr. Retrieved from https://idiyas.com/inventor/markus-baehr-krcoxsmf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations by Markus Baehr in Motor Vehicle Technology

Introduction

Markus Baehr is an accomplished inventor based in Goessweinstein, Germany. He has made significant contributions to the field of motor vehicle technology, particularly with his innovative designs that enhance vehicle functionality and safety.

Latest Patents

Markus Baehr holds a patent for a motor vehicle and reflector designed to improve the integration of HPEM sources. The patent describes a motor vehicle with a body featuring an opening that can be closed by a pivotable cover. A box-shaped metallic reflector, which is open towards the opening, is designed to receive an HPEM source and can be reversibly inserted into the opening. The reflector is connected to the vehicle body through an earth connection established after the reflector's insertion. This connection is facilitated by a brush strip made of conductive material, ensuring a secure and effective grounding.

Career Highlights

Markus Baehr is currently employed at Diehl Defence GmbH & Co. KG, where he continues to work on innovative projects that push the boundaries of motor vehicle technology. His expertise and dedication to his craft have made him a valuable asset to the company.

Collaborations

Markus collaborates with his coworker, Andreas Ganghofer, to further enhance their projects and drive innovation within their field.

Conclusion

Markus Baehr's contributions to motor vehicle technology, particularly through his patented designs, demonstrate his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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