Seewis, Switzerland

Markus Badertscher

This inventor holds 1 USPTO granted patent. Top assignee: Zellweger Uster Ag. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Markus Badertscher. Retrieved from https://idiyas.com/inventor/markus-badertscher-bkhudfgq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: The Innovations of Markus Badertscher

Introduction

Markus Badertscher is a notable inventor based in Seewis, Switzerland. He has made significant contributions to the field of textile machinery, particularly through his innovative designs and patents. His work has had a lasting impact on the industry, showcasing his expertise and creativity.

Latest Patents

One of Markus Badertscher's key patents is a "Device for manipulating healds or drop wires in a warp-thread drawing-in." This invention demonstrates his ability to address complex challenges in textile manufacturing, enhancing efficiency and functionality in the process.

Career Highlights

Markus Badertscher is currently employed at Zellweger Uster AG, a company renowned for its advancements in textile technology. His role at the company allows him to apply his inventive skills and contribute to the development of cutting-edge solutions in the industry.

Collaborations

Throughout his career, Markus has collaborated with various professionals, including his coworker Hermann Eglseer. These partnerships have fostered an environment of innovation and creativity, leading to the development of impactful technologies.

Conclusion

Markus Badertscher's contributions to the field of textile machinery through his patent and work at Zellweger Uster AG highlight his role as a significant inventor. His innovative spirit continues to drive advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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