This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1984.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1984
Title: Markus A. Zuegel and His Polysilicon Process Invention.
Introduction
Markus A. Zuegel is an inventor associated with Munich, Germany, and International Business Machines Corporation. His patent work addresses the adjustment of etched opening edges in polysilicon layers.
Latest Patents
The available information identifies one patent for Zuegel: “Method of Adjusting the Edge Angle in Polysilicon.” The invention describes pretreating a polysilicon layer before forming a photoresist mask, using a mixture of five parts water, one to three parts ammonia, and 0.25 to one part hydrogen peroxide. The treatment, advantageously performed at 40°C to 70°C, allows the steepness of the etched opening edges to be adjusted. Zuegel is associated with 1 patent.
Career Highlights
Zuegel’s documented patent contribution concerns semiconductor processing, specifically controlling the edge angles of openings etched into polysilicon. The patent lists International Business Machines Corporation as his associated company.
Collaborations
The provided information names Wolfgang Augstein and Peter U. Frasch as Zuegel’s coworkers. Their shared association provides context for his professional connections, though no specific joint patent work is identified here.
Conclusion
Markus A. Zuegel’s recorded invention presents a chemical pretreatment method for adjusting polysilicon edge angles, reflecting a focused contribution to semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile