Berlin, Germany

Marko Vogler

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Micro Resist Technology Gesellschaft Für Chemische Materialien Spezieller Protoresistsysteme Gmbh. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marko Vogler. Retrieved from https://idiyas.com/inventor/marko-vogler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Marko Vogler: Innovator in Nanoimprint Technology

Introduction

Marko Vogler is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of nanoimprint technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of nanoimprint processes.

Latest Patents

Marko Vogler holds a patent titled "Composition suitable for use as a release-optimized material for nanoimprint processes and uses thereof." This invention relates to a composition designed to improve the release properties during nanoimprint processes, thereby facilitating better production outcomes.

Career Highlights

Throughout his career, Marko has worked with prominent companies in the field. He has been associated with Micro Resist Technology Gesellschaft Für Chemische Materialien Spezieller Photoresistsysteme GmbH, where he contributed to advancements in chemical materials for photolithography. His expertise in the industry has been instrumental in driving innovation.

Collaborations

Marko has collaborated with talented individuals such as Hakki Hakan Atasoy and Gabi Grützner. These partnerships have allowed him to expand his knowledge and enhance his contributions to the field of nanoimprint technology.

Conclusion

Marko Vogler is a distinguished inventor whose work in nanoimprint technology has paved the way for advancements in the industry. His patent and collaborations reflect his commitment to innovation and excellence in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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