Hull, United Kingdom

Mark Ward

This inventor holds 1 USPTO granted patent. Top assignee: Reckitt & Colman (Overseas) Limited. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Ward. Retrieved from https://idiyas.com/inventor/mark-ward-rlxhiuqu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Mark Ward - Innovator in Surface Cleaning Solutions

Introduction

Mark Ward is a notable inventor based in Hull, GB. He has made significant contributions to the field of cleaning compositions, particularly with his innovative approach to multi-phase surface cleaning solutions. His work has garnered attention for its unique formulation and practical applications.

Latest Patents

Mark Ward holds 1 patent for his invention titled "Composition - A multi-phase surface cleaning composition." This innovative patent features a first phase that comprises an acidic cleaning formulation, while the second phase includes an alkaline cleaning formulation. Notably, the second phase incorporates a synthetic clay component, enhancing the effectiveness of the cleaning process.

Career Highlights

Mark is currently employed at Reckitt & Colman (Overseas) Limited, where he continues to develop and refine cleaning products. His expertise in formulating effective cleaning solutions has made him a valuable asset to the company.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as David Acher and Vikki Louise Binns. These partnerships have contributed to the advancement of innovative cleaning technologies.

Conclusion

Mark Ward's contributions to the field of surface cleaning compositions exemplify the impact of innovation in everyday products. His work continues to influence the industry and improve cleaning solutions for consumers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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