Mark W Jones

Title: Mark W Jones - Innovator in Metal Mask Technology

Introduction

Mark W Jones is a notable inventor based in Hyde Park, NY (US). He has made significant contributions to the field of metal mask-making processes. His innovative approach has led to advancements that enhance the efficiency and effectiveness of these processes.

Latest Patents

Mark W Jones holds a patent for a "High aspect ratio molybdenum composite mask method." This patent describes an improved metal mask-making process that begins with a metal mask featuring etched apertures. The process involves coating the mask conformably with a substantially thick layer, which reduces the minimum aperture size while increasing the mask's thickness. The conformal layer is selected for its minimal stress, good adhesion, and thermal compatibility with the original metal mask material. Additionally, thin conformal coatings can be applied to provide mechanical and chemical resistance to the metal mask.

Career Highlights

Mark W Jones is associated with the International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop innovative technologies that have practical applications in various industries.

Collaborations

Throughout his career, Mark has collaborated with notable colleagues, including Donald R Cowell and Chang-Ching Kin. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Mark W Jones is a distinguished inventor whose work in metal mask technology has paved the way for improved manufacturing processes. His contributions continue to influence the industry and inspire future innovations.