Mark W Goldsborough

Title: Mark W Goldsborough: Innovator in Semiconductor Technology

Introduction

Mark W Goldsborough is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent in chemical vapor deposition.

Latest Patents

Goldsborough holds a patent for a Rapid Thermal CVD Apparatus. This invention involves a chemical vapor deposition apparatus designed for coating semiconductor wafers. In this apparatus, the wafer is held face down in the reaction chamber, with a radiant heat source positioned above the wafer and outside the reaction chamber. The wafer is secured on a ring chuck by a retractable clamp, allowing it to be heated from its backside to temperatures exceeding 1000 degrees Celsius rapidly. The radiant heat source consists of cylindrical lamps arranged in a radial pattern to enhance heating uniformity. During the selective tungsten process, the wafer's temperature is elevated from ambient to approximately 600 degrees Celsius while process gases are flowing. At the upper temperature range, the heating source can be quickly cycled on and off to improve coating uniformity.

Career Highlights

Goldsborough has had a distinguished career at Varian Associates, Inc., where he has applied his expertise in semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of chemical vapor deposition processes.

Collaborations

Throughout his career, Goldsborough has collaborated with notable colleagues, including Daniel L Brors and Larry R Lane. These collaborations have contributed to the development of innovative technologies in the semiconductor industry.

Conclusion

Mark W Goldsborough's contributions to semiconductor technology through his patent for a Rapid Thermal CVD Apparatus highlight his role as an innovator in the field. His work continues to influence advancements in chemical vapor deposition processes.