This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: General Electric Company. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Mark Victor Penna: Innovator in Metrology Technology
Introduction
Mark Victor Penna is an accomplished inventor based in Wake Forest, NC (US). He has made significant contributions to the field of metrology through his innovative patent. His work focuses on enhancing the efficiency and accuracy of metrology systems.
Latest Patents
Mark Victor Penna holds a patent for a "Method and system of a timer based buffer used for metrology." This patent describes methods and systems that utilize a timer-based memory buffer for metrology applications. One embodiment of the method involves receiving metrology data from one or more sensors, writing part of this data to volatile memory, and incrementing a write pointer to track the data. This process continues until a timer expires, at which point a portion of the metrology data is read from the volatile memory. This innovative approach aims to improve the reliability and performance of metrology systems.
Career Highlights
Mark Victor Penna is associated with General Electric Company, where he applies his expertise in metrology technology. His work at General Electric has allowed him to contribute to various projects that enhance the company's technological capabilities.
Collaborations
Throughout his career, Mark has collaborated with notable colleagues, including Bradley Richard Ree and George William Alexander. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Mark Victor Penna is a notable inventor whose work in metrology technology has led to significant advancements in the field. His innovative patent and contributions at General Electric Company highlight his commitment to improving metrology systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
