Bristol, United Kingdom

Mark Venables


 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovations of Mark Venables: A Pioneer in Reactive Ion Etching

Introduction

Mark Venables, an accomplished inventor based in Bristol, GB, has made significant contributions to the field of semiconductor manufacturing. With a focus on innovative processes, he holds one notable patent that showcases his expertise in reactive ion etching—a method crucial in the preparation of intricate chip designs.

Latest Patents

Mark Venables is credited with a patent for a method of reactive ion etching that involves creating at least two etched features on a substrate. The first feature is designed with a greater aspect ratio (depth:width) than the second. This patent outlines a two-stage etching process, wherein the substrate is first etched to a specific depth for the first feature, followed by a second etching stage that allows for both features to be etched to their respective depths. This process includes applying a mask to define specific apertures that align with the intended features. Additionally, a secondary masking step is employed to selectively protect the area for the second feature during the initial etching stage.

Career Highlights

Mark Venables has established himself as an integral member of Atlantic Inertial Systems, Inc., where his innovative work in reactive ion etching has advanced the company's capabilities in high-precision manufacturing. His commitment to advancing technology in this field has earned him recognition among his peers and has positioned Atlantic Inertial Systems as a leader in its sector.

Collaborations

Throughout his career, Mark has collaborated with talented colleagues, including Tracey Hawke and Ian Michael Sturland. These partnerships reflect a shared commitment to innovation and excellence, resulting in meaningful advancements in technology.

Conclusion

Mark Venables is a visionary inventor whose work in reactive ion etching continues to impact the semiconductor industry. His single, yet pivotal patent demonstrates his dedication to improving manufacturing processes, ensuring that the next generation of technology will benefit from his insights and innovations.

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