New Wilmington, PA, United States of America

Mark Vavithes

This inventor holds 1 USPTO granted patent. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Vavithes. Retrieved from https://idiyas.com/inventor/mark-vavithes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 15.0

ph-index = 1


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Mark Vavithes

Introduction

Mark Vavithes is an inventive individual based in New Wilmington, PA (US). He has made significant contributions to the field of footwear technology. His innovative spirit is exemplified through his patent, which addresses a common issue faced by many footwear users.

Latest Patents

Mark Vavithes holds a patent for a "Tension maintaining system for footwear laces." This invention features a clamp that includes a cap, a base, a plurality of staggered protrusions on both the cap and the base, a hinge, and a latch. The hinge is defined by the cap and the base, while the latch is designed to secure the cap to the base. This system allows for effective clamping of at least two laces on footwear, enhancing the overall user experience. He has 1 patent to his name.

Career Highlights

Throughout his career, Mark has focused on developing practical solutions that improve everyday products. His work in the footwear industry showcases his ability to identify problems and create effective solutions.

Collaborations

Mark has worked alongside talented individuals such as Shmuley Reitman and Faith August. Their collaborative efforts have contributed to the development of innovative products in the footwear sector.

Conclusion

Mark Vavithes is a notable inventor whose work has made a positive impact on footwear technology. His patent for a tension maintaining system demonstrates his commitment to innovation and problem-solving. His contributions will continue to influence the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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