This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1978.
Company Filing History:
Years Active: 1978
Title: Mark V Powell: Innovator in Photoresist Technology
Introduction
Mark V Powell is a notable inventor based in San Jose, California. He has made significant contributions to the field of photoresist technology, particularly through his innovative patent. His work has implications for various applications in the semiconductor industry.
Latest Patents
Mark V Powell holds a patent for a "Single level masking process with two positive photoresist layers." This process involves the use of two layers of positive photoresist, where a pattern is formed in the first layer. The first layer is then heated and polymerized to ensure it remains intact when a second layer is applied. After the heat treatment, the first layer becomes substantially insensitive to actinic radiation and can be easily stripped with conventional solvents. A different pattern is formed in the second layer, allowing for the deposition of metals on the substrate in a controlled manner.
Career Highlights
Mark V Powell is associated with International Business Machines Corporation (IBM), where he has contributed to advancements in photoresist processes. His innovative approach has enhanced the efficiency and effectiveness of semiconductor manufacturing techniques.
Collaborations
Some of his notable coworkers include Peter J Duke and Leo C Liclican, who have collaborated with him on various projects within the field.
Conclusion
Mark V Powell's contributions to photoresist technology exemplify the importance of innovation in the semiconductor industry. His patent reflects a significant advancement that can lead to improved manufacturing processes.