Walnut, CA, United States of America

Mark Thomas Dimke

This inventor holds 1 USPTO granted patent. Top assignee: The Dexter Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Thomas Dimke. Retrieved from https://idiyas.com/inventor/mark-thomas-dimke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Innovations by Mark Thomas Dimke

Introduction

Mark Thomas Dimke is an accomplished inventor based in Walnut, California. He has made significant contributions to the field of epoxy compounds, particularly in methods aimed at reducing chloride content. His innovative approach has the potential to enhance the quality and performance of epoxy materials used in various applications.

Latest Patents

Mark Thomas Dimke holds a patent for "Methods of reducing the chloride content of epoxy compounds." This invention outlines methods for reducing the chloride content in epoxy compound starting materials. The methods involve subjecting specific combinations of epoxy resin and other components to conditions that yield a treated epoxy compound with reduced chloride content. The patent also discusses various components that can be used in the process, including mixtures of crown ether, organic solvents, and suitable bases.

Career Highlights

Dimke is associated with The Dexter Corporation, where he applies his expertise in developing innovative solutions for epoxy compounds. His work has contributed to advancements in the field, showcasing his commitment to improving material properties and performance.

Collaborations

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Conclusion

Mark Thomas Dimke's contributions to the field of epoxy compounds through his innovative patent demonstrate his dedication to advancing material science. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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