This inventor holds 1 USPTO granted patent. Top assignee: Air Products and Chemicals, Inc.. Active years: 1998.
Company Filing History:
Years Active: 1998
Title: Mark Shedrick Simpson: Innovator in Chemical Processing
Introduction
Mark Shedrick Simpson is a notable inventor based in Germansville, PA (US). He has made significant contributions to the field of chemical processing, particularly in the treatment of dinitrotoluene wash streams. His innovative approach has led to the development of a patented process that addresses environmental concerns associated with chemical waste.
Latest Patents
Mark Shedrick Simpson holds a patent for a process titled "Dilute acid oxidation of dinitrotoluene alkaline wash water." This invention focuses on removing nitrocresols from a crude aqueous alkaline dinitrotoluene wash stream. The process involves mixing the wash stream with a dilute oxidizing acid, such as nitric acid, and heating it to temperatures between 130°C and 180°C. This treatment effectively reduces nitrocresols to a level that prevents precipitation from the wash stream at elevated temperatures. The remaining nitrocresols can then be removed using conventional methods, such as adsorption or activated sludge biotreatment. He has 1 patent to his name.
Career Highlights
Mark is currently employed at Air Products and Chemicals, Inc., where he continues to work on innovative solutions in chemical processing. His expertise in the field has made him a valuable asset to the company and the industry as a whole.
Collaborations
Throughout his career, Mark has collaborated with various professionals, including his coworker Richard Van Carr. These collaborations have fostered an environment of innovation and have contributed to the advancement of chemical processing technologies.
Conclusion
Mark Shedrick Simpson's contributions to the field of chemical processing through his patented innovations demonstrate his commitment to addressing environmental challenges. His work continues to influence the industry and pave the way for future advancements.
