Shanghai, China

Mark Sha

This inventor holds 1 USPTO granted patent. Top assignee: Wacker Chemie Ag. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Sha. Retrieved from https://idiyas.com/inventor/mark-sha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Mark Sha - Innovator in Silane Oligomer Technology

Introduction

Mark Sha is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of silane oligomer technology. His innovative work has led to the development of a unique process that enhances the stability and utility of epoxy silane oligomers.

Latest Patents

Mark Sha holds a patent for the "Process for silane oligomer composition preparation and use thereof." This patent describes a method for preparing epoxy silane oligomers from a glycidoxypropyl alkoxysilane in the presence of an alcohol and an esterification and/or transesterification catalyst. The resulting oligomers exhibit improved storage stability and are particularly useful as scrub-resistant additives for aqueous architectural coatings. He has 1 patent to his name.

Career Highlights

Mark Sha is currently employed at Wacker Chemie AG, a leading company in the chemical industry. His role involves research and development in the area of silane oligomers, where he applies his expertise to create innovative solutions for various applications.

Collaborations

Throughout his career, Mark has collaborated with notable colleagues, including Deng Feng Ji and Shuai (Tony) Tian. These collaborations have further enriched his research and contributed to advancements in the field.

Conclusion

Mark Sha's contributions to silane oligomer technology demonstrate his commitment to innovation and excellence. His work not only enhances product performance but also sets a benchmark in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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