Mark Schürmann

Title: Mark Schürmann: Innovator in Reflector Technology

Introduction

Mark Schürmann is a notable inventor based in Jena, Germany. He has made significant contributions to the field of reflector technology, holding a total of 3 patents. His work focuses on innovative methods for manufacturing reflector elements, which have applications in various industries.

Latest Patents

One of his latest patents is titled "Reflector element and a method for manufacturing same." This patent discloses a reflector element that includes a plastic substrate and a silver layer arranged on the substrate. Additionally, it features a first barrier layer with an oxide layer of at least 15 nm thickness and a second barrier layer made of siloxane, with a thickness ranging from 250 nm to 450 nm. Another significant patent is for a "Method for producing a reflector element and reflector element," which outlines a process that involves depositing a layer sequence on a substrate. This sequence includes at least one mirror layer and a reactive multilayer system, which is ignited to activate heat input in the layer sequence.

Career Highlights

Throughout his career, Mark Schürmann has worked with prominent organizations, including the Fraunhofer Society for the Advancement of Applied Research and Siteco GmbH. His experience in these companies has allowed him to refine his expertise in reflector technology and contribute to various innovative projects.

Collaborations

Mark has collaborated with several professionals in his field, including Stefan Schwinde and Norbert Kaiser. These collaborations have further enhanced his work and led to advancements in reflector technology.

Conclusion

Mark Schürmann is a distinguished inventor whose work in reflector technology has led to multiple patents and significant advancements in the field. His innovative methods and collaborations continue to influence the industry positively.