Austin, TX, United States of America

Mark S Williams


Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2007-2008

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2 patents (USPTO):Explore Patents

Title: The Innovations of Mark S. Williams

Introduction

Mark S. Williams is an accomplished inventor based in Austin, Texas. He has made significant contributions to the field of technology, particularly in the areas of surface patterning and symmetry detection. With two patents to his name, Williams has demonstrated his expertise and innovative thinking.

Latest Patents

Williams' latest patents include "Parallel-beam scanning for surface patterning of materials" and "Discrete curve symmetry detection." The first patent describes a system and method for parallel-beam scanning a surface, utilizing an energetic beam source that emits a collimated beam. This beam is directed by an optical device, which includes various optical media and actuators to perform precise movements. The device illuminates specified regions of a surface, enhancing the efficiency of surface patterning. The second patent focuses on detecting symmetries of discrete curves. It employs a mapping operator to amplify features of a discrete curve and computes correlations with shifted versions of another curve. This process allows for the determination of symmetry groups based on the relationships between the curves.

Career Highlights

Throughout his career, Williams has worked with notable companies such as Semicube, Inc. and National Instruments Corporation. His experience in these organizations has contributed to his development as an inventor and has provided him with valuable insights into the industry.

Collaborations

Williams has collaborated with several professionals, including Raymond M. Warner, Jr. and Lynn Millar, who serves as a legal representative. These collaborations have likely enriched his work and expanded his network within the field.

Conclusion

Mark S. Williams is a notable inventor whose work in surface patterning and symmetry detection showcases his innovative spirit. His contributions to technology continue to influence the industry, and his patents reflect his commitment to advancing knowledge in his field.

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