Dallas, TX, United States of America

Mark S Rodder

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mark S. Rodder: Innovator in Field-Effect Transistor Technology

Introduction

Mark S. Rodder is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of electronics, particularly in the development of field-effect transistors (FETs). His innovative work has led to advancements in CMOS circuit applications.

Latest Patents

Mark S. Rodder holds a patent for a "Method of forming multiple-Vt FETS for CMOS circuit applications." This patent describes a field-effect transistor device that features a modulated threshold voltage (Vt). The device includes a source electrode, a drain electrode, and a channel region that extends between these electrodes. Additionally, it incorporates a gate stack on the channel region, which consists of an ultrathin dielectric dipole layer designed to shift the modulated Vt in one direction, a high-k (HK) insulating layer on the dipole layer, and a gate metal layer that shifts the modulated Vt in the opposite direction. This innovative design enhances the performance and efficiency of CMOS circuits.

Career Highlights

Mark S. Rodder is currently employed at Samsung Electronics Ltd., where he continues to push the boundaries of technology. His work at Samsung has allowed him to collaborate with other talented engineers and researchers in the field.

Collaborations

One of his notable coworkers is Wei-E Wang, with whom he has likely shared insights and expertise in the development of advanced electronic components.

Conclusion

Mark S. Rodder's contributions to the field of field-effect transistors and CMOS technology highlight his role as an influential inventor. His patent and ongoing work at Samsung Electronics Ltd. demonstrate his commitment to innovation in electronics.

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