Mark S Prichard

Title: Mark S Prichard: Innovator in Laser Technology

Introduction

Mark S Prichard is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of laser technology, particularly in the exposure of laser-sensitive materials. His innovative approach has led to the development of a unique method that minimizes the effects of intermittency in light-sensitive materials.

Latest Patents

Mark S Prichard holds a patent for a method titled "Method for the exposure of laser sensitive materials without the effects." This patent describes a technique for exposing light-sensitive material to create exposure patches that represent material sensitivity. The method utilizes a continuous wave pump laser and a dye laser to produce a second beam of light with specific intensity distributions. This innovative approach allows for scanning the light beam through targets of varying uniform densities, resulting in uniform exposure patches while minimizing the effects of intermittency.

Career Highlights

Throughout his career, Mark has been associated with the Eastman Kodak Company, where he has applied his expertise in laser technology. His work has contributed to advancements in imaging and material sensitivity, showcasing his commitment to innovation in the field.

Collaborations

Mark has collaborated with notable colleagues, including Howard C Brayman and John P Spoonhower. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Mark S Prichard's contributions to laser technology and his innovative methods have made a significant impact in his field. His work continues to influence advancements in the exposure of laser-sensitive materials, demonstrating the importance of innovation in technology.