Company Filing History:
Years Active: 1997-2002
Title: Innovations by Mark S Lucas
Introduction
Mark S Lucas is an accomplished inventor based in Groton, MA (US). He has made significant contributions to the field of lithography, holding two patents that address critical challenges in the industry. His work demonstrates a commitment to advancing technology and improving processes in lithographic systems.
Latest Patents
Mark S Lucas's latest patents include a reticle alignment system for use in lithography and a lithography system using dual substrate stages. The reticle alignment system addresses misalignment errors in lithographic systems caused by environmental changes affecting the lens system. It utilizes a fiducial on the reticle, which is projected through the lens, and a metrology plate that holds reference mirrors and detectors. This setup provides feedback to the alignment system, allowing for precise corrections by moving the reticle until alignment is achieved. The second patent, the lithography system using dual substrate stages, employs two stages in a single lithographic system. While one substrate is being exposed, the other is loaded, unloaded, or aligned, allowing for simultaneous processing and increased efficiency.
Career Highlights
Throughout his career, Mark S Lucas has worked with notable companies such as Mrs Technology, Inc. and Azores Corporation. His experience in these organizations has contributed to his expertise in developing innovative solutions in lithography.
Collaborations
Mark has collaborated with professionals like Robert A McEachern and Craig R Simpson, further enhancing his work through shared knowledge and expertise.
Conclusion
Mark S Lucas is a notable inventor whose contributions to lithography have led to significant advancements in the field. His innovative patents reflect his dedication to improving technology and processes in the industry.