Murrieta, CA, United States of America

Mark Rumsey

This inventor holds 1 USPTO granted patent. Top assignee: American Learning Systems, Inc.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Rumsey. Retrieved from https://idiyas.com/inventor/mark-rumsey-oaf30p6x

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 16.0

ph-index = 1

Forward Citations = 19(Granted Patents)


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mark Rumsey - Innovator in Blade Sharpening Technology

Introduction

Mark Rumsey is an accomplished inventor based in Murrieta, California. He has made significant contributions to the field of blade sharpening technology. With a focus on innovation, he has developed a unique patent that enhances the efficiency of blade maintenance.

Latest Patents

Mark Rumsey holds a patent for a blade sharpener housing. This invention is designed to improve the functionality and durability of blade sharpeners, making them more effective for users. His innovative approach has led to the creation of a product that stands out in the market.

Career Highlights

Mark is currently employed at American Learning Systems, Inc. His role at the company allows him to apply his inventive skills and contribute to the development of educational tools and technologies. His dedication to innovation is evident in his work and the impact it has on the industry.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as Franco Lodato and Massimo Salafia. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Mark Rumsey is a notable inventor whose work in blade sharpening technology exemplifies innovation and creativity. His contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…