Webster, NY, United States of America

Mark R O'Donnell

This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark R O'Donnell. Retrieved from https://idiyas.com/inventor/mark-r-o-donnell-979wv80n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Mark R O'Donnell: Innovator in Radiation Exposure Technology

Introduction

Mark R O'Donnell is a notable inventor based in Webster, NY (US). He has made significant contributions to the field of radiation exposure technology. His innovative work has led to the development of a unique apparatus and method that enhances the precision of radiation exposure.

Latest Patents

Mark R O'Donnell holds a patent for an "Apparatus and method for producing gradated exposures on radiation." This invention involves a method and apparatus referred to as a step and repeat sensitometer. It directs radiant energy from a source into a diffuse integrating chamber, which uniformly mixes and directs the energy onto an exposure plane. This allows for individual areas of a radiation-sensitive sample to be exposed to adjustable levels of illuminance, producing gradated exposures. He has 1 patent to his name.

Career Highlights

Mark R O'Donnell is associated with the Eastman Kodak Company, where he has applied his expertise in developing innovative solutions in imaging technology. His work has been instrumental in advancing the capabilities of radiation exposure methods.

Collaborations

Throughout his career, Mark has collaborated with notable colleagues, including James E Bird and Howard P Jehan. These collaborations have contributed to the success of his projects and innovations.

Conclusion

Mark R O'Donnell's contributions to radiation exposure technology exemplify the impact of innovation in scientific fields. His work continues to influence advancements in imaging and radiation applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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