Mark Pilloff

Title: Mark Pilloff: Innovator in Semiconductor Fabrication

Introduction

Mark Pilloff is a notable inventor based in Millbrae, CA (US). He has made significant contributions to the field of semiconductor fabrication, particularly in optical proximity correction. His innovative approach has led to the development of a unique patent that enhances the efficiency of integrated circuit layouts.

Latest Patents

Mark Pilloff holds a patent titled "Flexible shape identification for optical proximity correction in semiconductor fabrication." This patent describes a method where transient edges are utilized to define shapes in an integrated circuit layout for optical proximity correction. The first variation of the shape includes a first edge and a second edge that satisfies an edge transition angle condition in relation to the first edge. Additionally, one or more first transition edges connect the first edge and the second edge. The second variation of the shape includes a third edge and a fourth edge that also satisfies the same edge transition angle condition. This innovative approach allows for flexibility and efficiency in the shape identification process for optical proximity correction, despite the differences between the first and second transition edges.

Career Highlights

Mark Pilloff is currently associated with Aprio Technologies, Inc., where he continues to push the boundaries of innovation in semiconductor technology. His work has been instrumental in advancing the capabilities of optical proximity correction, which is crucial for the production of high-performance integrated circuits.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as Shao-Po Wu and Xin Wang. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Mark Pilloff's contributions to semiconductor fabrication through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work not only enhances the efficiency of integrated circuit layouts but also showcases the importance of collaboration in driving innovation.