Industry, CA, United States of America

Mark Osowski

This inventor holds 1 USPTO granted patent. Top assignee: Lincoln Global, Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Osowski. Retrieved from https://idiyas.com/inventor/mark-osowski-xjlz3ugu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Mark Osowski: Innovator in Integrated Control Systems

Introduction

Mark Osowski is a notable inventor based in Industry, California. He has made significant contributions to the field of integrated control systems, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of cutting and marking operations.

Latest Patents

Mark Osowski holds a patent for a "System and method for integrated controller." This invention pertains to a system and method related to integrating cutting or marking operation parameters and motion parameters. The controller he developed manages both process-related control and motion-related controls, eliminating the need for separate controllers. This integration improves the dynamics of cutting or marking operations while minimizing connectivity and data communications.

Career Highlights

Osowski is currently employed at Lincoln Global, Inc., where he continues to work on advancing technologies in his field. His expertise and innovative mindset have positioned him as a valuable asset to the company.

Collaborations

Mark collaborates with Jackie Laverne Winn, contributing to the development of cutting-edge solutions in integrated control systems.

Conclusion

Mark Osowski's contributions to integrated control systems through his patent demonstrate his commitment to innovation and efficiency in technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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