This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 1991.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991
Title: Mark Nestle: Innovator in Vacuum Drum Technology
Introduction
Mark Nestle is a notable inventor based in Spencerport, NY (US). He has made significant contributions to the field of vacuum drum technology, holding a patent that showcases his innovative approach to engineering.
Latest Patents
Mark Nestle holds a patent for a "Drilled unported vacuum drum with a porous sleeve." This invention features an unported vacuum drum equipped with a system of closely spaced small grooves on its outer surface. Holes drilled into the drum allow communication between these grooves and the interior space of the drum. By connecting the interior drum to a vacuum source, the vacuum can be applied through the holes to the grooves. To prevent defects in a web that comes into contact with the drum, the outer surface is covered with a porous sleeve. The pores in the sleeve facilitate the application of vacuum from the grooves to the outer surface, effectively holding the web onto the sleeve. This innovative design enhances the functionality and reliability of vacuum drums in various applications.
Career Highlights
Mark Nestle is associated with the Eastman Kodak Company, where he has contributed his expertise in engineering and innovation. His work has been instrumental in advancing technologies that improve manufacturing processes and product quality.
Collaborations
Throughout his career, Mark has collaborated with talented individuals such as Roger Haas and Joseph Distefano. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Mark Nestle's contributions to vacuum drum technology exemplify the spirit of innovation. His patent reflects a deep understanding of engineering principles and a commitment to enhancing industrial processes. His work continues to influence the field and inspire future inventors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
