Inver Grove Heights, MN, United States of America

Mark Nelson

This inventor holds 1 USPTO granted patent. Top assignee: Sky Water Technology Foundry, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Nelson. Retrieved from https://idiyas.com/inventor/mark-nelson-yr6n61h5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Mark Nelson: Inventor in Semiconductor Technology

Introduction

Mark Nelson is an inventor associated with Inver Grove Heights, Minnesota, and SkyWater Technology Foundry, Inc. His work includes a patent concerning the integration of carbon film into semiconductor manufacturing.

Latest Patents

Nelson is named on one patent: “Carbon Film Integrated into a Back End of Line Process.” The patent describes depositing a carbon film by physical vapor deposition onto a surface formed during the back-end-of-line stage of complementary metal-oxide-semiconductor processing. Depending on the device and its design, the resulting carbon nano-film can serve as different electronic components. One described application is a carbon nano-fuse that can function as a permanent data-storage element in memory cells.

Career Highlights

The patent reflects work at the intersection of materials engineering and semiconductor fabrication. It outlines a way to incorporate carbon nano-films into established manufacturing processes, with potential applications in electronic devices and memory technology.

Collaborations

Nelson’s listed coworkers include Peter N. Manos II and Vahid Gholizadeh. The patent information connects his work with SkyWater Technology Foundry, Inc.

Conclusion

Mark Nelson’s patent describes a carbon nano-film fabrication approach that could support electronic components and permanent data storage, highlighting his contribution to semiconductor innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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