Phoenixville, PA, United States of America

Mark N Kawchak



Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 93(Granted Patents)


Company Filing History:


Years Active: 2002-2009

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4 patents (USPTO):Explore Patents

Title: Innovations of Mark N Kawchak in High Purity Tantalum

Introduction

Mark N Kawchak is an accomplished inventor based in Phoenixville, PA (US). He has made significant contributions to the field of materials science, particularly in the development of high purity tantalum metals and alloys. With a total of 4 patents to his name, Kawchak's work has implications for various industrial applications.

Latest Patents

Kawchak's latest patents focus on high purity tantalum, products containing the same, and methods of making the same. His innovations describe tantalum metal with a purity of at least 99.995%, and more preferably at least 99.999%. The patents detail tantalum metals and alloys that possess specific properties, such as a grain size of about 50 microns or less, or a texture characterized by a (100) intensity within any 5% increment of thickness being less than about 15 random. Additionally, the patents disclose articles and components made from tantalum metal, including sputtering targets, capacitor cans, and resistive film layers. The process for producing high purity tantalum involves reacting a salt-containing tantalum with a reducing compound in a specially designed reaction container.

Career Highlights

Throughout his career, Mark N Kawchak has worked with notable companies such as Cabot Corporation and Global Advanced Metals USA, Inc. His experience in these organizations has contributed to his expertise in the field of tantalum and advanced materials.

Collaborations

Kawchak has collaborated with professionals like Christopher A Michaluk and Louis E Huber, further enhancing his contributions to the industry.

Conclusion

Mark N Kawchak's innovations in high purity tantalum have paved the way for advancements in materials science and various industrial applications. His patents reflect a commitment to quality and precision in the development of tantalum products.

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