Mark M Spiecker

Title: Mark M Spiecker: Innovator in Surface Patterning Technologies

Introduction

Mark M Spiecker is a notable inventor based in Denver, CO (US), recognized for his contributions to surface patterning technologies. With a total of 4 patents, he has made significant strides in the field of material science and engineering.

Latest Patents

Among his latest patents is a method of patterning a surface and articles comprising the same. This invention describes an article with a curved surface, upon which a plurality of patterns is disposed. Each pattern is defined by a series of spaced apart features that are either attached to or projected into the curved surface. Notably, each feature has at least one neighboring feature with a substantially different geometry. The average spacing between adjacent features ranges from about 1 nanometer to about 1 millimeter in certain portions of the curved surface. Furthermore, the spaced apart features are represented by a periodic function, showcasing the innovative approach taken by Spiecker in this domain.

Career Highlights

Mark M Spiecker is affiliated with the University of Florida Research Foundation, Incorporated, where he continues to advance his research and development efforts. His work has garnered attention for its potential applications in various industries, particularly those focused on advanced materials and nanotechnology.

Collaborations

Throughout his career, Spiecker has collaborated with esteemed colleagues, including Anthony B Brennan and Joseph W Bagan. These partnerships have contributed to the depth and breadth of his research endeavors.

Conclusion

Mark M Spiecker stands out as an influential inventor in the realm of surface patterning technologies. His innovative patents and collaborations reflect his commitment to advancing scientific knowledge and practical applications in material science.