Mark Lin

Title: Mark Lin - Innovator in Thin Film Technology

Introduction

Mark Lin is a notable inventor based in Yungkang, Taiwan. He has made significant contributions to the field of thin film technology, particularly through his innovative manufacturing methods. His work has led to advancements that enhance the performance of various optical devices.

Latest Patents

Mark Lin holds a patent for a manufacturing method for a thin film with an anti-reflection rough surface. This invention provides a detailed process that begins with forming a thin film over a substrate. An amorphous silicon layer is then created over the thin film. Following this, a first annealing procedure is performed in situ, transforming the amorphous silicon layer into a polysilicon layer with an anti-reflection rough surface. A second selective annealing procedure is also conducted, during which the polysilicon layer is doped by reacting with an induced gas. Ultimately, this process results in the formation of a poly film with an anti-reflection rough surface over the substrate.

Career Highlights

Mark Lin is currently employed at United Semiconductor Corporation, where he continues to innovate in the semiconductor industry. His expertise in thin film technology has positioned him as a valuable asset to his company and the broader field.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as Jacky Kuo and Steven Hsiao. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Mark Lin's contributions to thin film technology exemplify the spirit of innovation. His patent for a manufacturing method with an anti-reflection rough surface showcases his commitment to advancing the field. As he continues to work at United Semiconductor Corporation, his impact on the industry is sure to grow.