Mark L F Phillips

Title: Mark L F Phillips: Innovator in Dielectric Materials

Introduction

Mark L F Phillips is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of dielectric materials, holding a total of 4 patents. His work focuses on developing advanced materials that have applications in various technological domains.

Latest Patents

Phillips' latest patents include innovative compositions and methods for producing low-k dielectric materials. One of his patents describes a sol composition that includes silicate esters, polar solvents, and nonmetallic catalysts to create a porous low-k dielectric material. This composition is designed to reduce the dielectric constant in the produced material, enhancing its performance in electronic applications. Another patent outlines a method for fabricating high-dielectric constant thin film metal oxides on silicon wafers, which are crucial for capacitor applications. This method utilizes ordered mesoporous structures and low-temperature processing techniques to achieve high-quality films.

Career Highlights

Throughout his career, Mark L F Phillips has worked with various companies, including Sba Materials, Inc. His expertise in material science and engineering has allowed him to contribute to the development of cutting-edge technologies in the field.

Collaborations

Phillips has collaborated with notable professionals in his field, including Travis P S Thoms and Shyama P Mukherjee. These collaborations have further enriched his research and innovation efforts.

Conclusion

Mark L F Phillips is a distinguished inventor whose work in dielectric materials has paved the way for advancements in technology. His patents reflect a commitment to innovation and excellence in material science.