This inventor holds 1 USPTO granted patent. Top assignee: Advanced Micro Devices Corporation. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Mark K Shackelford: Innovator in Real-Time Detection Systems
Introduction
Mark K Shackelford is a notable inventor based in Round Rock, TX (US). He has made significant contributions to the field of real-time detection systems, particularly in the area of photolithography. His innovative work has led to the development of a patented system that enhances the detection of focus-related defects.
Latest Patents
Mark K Shackelford holds a patent for a "System for enabling the real-time detection of focus-related defects." This real-time hotspot detection system is designed to improve the efficiency and accuracy of fault detection in photolithography processes. The system utilizes a modified photolithography stepper that outputs z-height focus data for each cell to a fault detection module. After the wafer is exposed, the module computes statistical data and compares it to predetermined limits. If deviations are detected, the system halts operations and alerts the operator, facilitating immediate corrective actions.
Career Highlights
Mark K Shackelford is associated with Advanced Micro Devices Corporation, where he has contributed to advancements in semiconductor technology. His work has been instrumental in enhancing the reliability of manufacturing processes in the industry. With a focus on innovation, he continues to push the boundaries of technology in his field.
Collaborations
Throughout his career, Mark has collaborated with esteemed colleagues such as R Michael Greig and Robert Stone. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further driving innovation in their projects.
Conclusion
Mark K Shackelford's contributions to real-time detection systems exemplify the impact of innovative thinking in technology. His patented system not only addresses critical challenges in photolithography but also sets a precedent for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
