Mark J O'Hara

Title: Mark J O'Hara: Innovator in Semiconductor Processing

Introduction

Mark J O'Hara is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work focuses on improving the efficiency and effectiveness of thermal processing systems.

Latest Patents

Mark J O'Hara holds a patent for "Systems and methods for epitaxial processing of a semiconductor substrate." This invention describes a thermal processing system and method designed for processing semiconductor substrates. The system utilizes an inductor to couple energy to a susceptor, with a specific configuration that enhances temperature uniformity during various stages of the chemical vapor deposition (CVD) epitaxial deposition process. By adjusting the distance between the inductor and the susceptor, the invention addresses common temperature non-uniformities that can lead to defects in semiconductor materials. Additionally, the patent includes improvements in thermal shielding and suggests that thicker susceptors can further enhance temperature uniformity.

Career Highlights

Mark J O'Hara is currently employed at Mattson Technology, Inc., where he continues to develop innovative solutions in semiconductor technology. His expertise in thermal processing systems has positioned him as a valuable asset in the industry.

Collaborations

Throughout his career, Mark has collaborated with notable colleagues, including Robert D Mailho and Glenn A Pfefferkorn. These partnerships have contributed to advancements in semiconductor processing technologies.

Conclusion

Mark J O'Hara's contributions to semiconductor processing through his innovative patent demonstrate his commitment to enhancing technology in this critical field. His work continues to influence the industry and improve the efficiency of semiconductor manufacturing processes.