Schenectady, NY, United States of America

Mark J Bausch

This inventor holds 1 USPTO granted patent. Top assignee: General Electric Company. Active years: 1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark J Bausch. Retrieved from https://idiyas.com/inventor/mark-j-bausch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: Mark J Bausch: Innovator in Polyetheramideimide Technology

Introduction

Mark J Bausch is a notable inventor based in Schenectady, NY (US). He has made significant contributions to the field of materials science, particularly in the development of polyetheramideimide technology. His innovative work has led to advancements that enhance the performance of materials in various applications.

Latest Patents

Mark J Bausch holds a patent for a "Solvent resistant polyetheramideimide containing benzanilide units." This invention provides a method for making polyetheramideimide utilizing aromatic bis(etheranhydride) and diaminobenzanilide or mixtures thereof with an organic diamine. The resulting polyetheramideimide has been found to exhibit improved solvent resistance, making it a valuable material in industrial applications. He has 1 patent to his name.

Career Highlights

Mark J Bausch is associated with General Electric Company, where he has contributed to various projects and innovations. His work at GE has allowed him to collaborate with other talented professionals in the field, further enhancing his expertise and impact.

Collaborations

Some of his notable coworkers include Elbridge A O'Neil, Jr and John W Verbicky. Their collaborative efforts have likely contributed to the success of various projects within the company.

Conclusion

Mark J Bausch's contributions to the field of polyetheramideimide technology demonstrate his innovative spirit and commitment to advancing material science. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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