Plano, TX, United States of America

Mark Frank Vanderburg

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Frank Vanderburg. Retrieved from https://idiyas.com/inventor/mark-frank-vanderburg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Mark Frank Vanderburg

Introduction

Mark Frank Vanderburg is an accomplished inventor based in Plano, TX (US). He has made significant contributions to the field of optical networking. His innovative work has led to the development of a unique protocol that enhances the efficiency of optical networks.

Latest Patents

Vanderburg holds a patent for an "Optical link adjacency discovery protocol and an optical network therefor." This protocol provides a simple format that includes an identifier field of a local node and facility, as well as an identifier field of an echo node and facility. The protocol facilitates communication between nodes in an optical network, allowing for the efficient discovery of link adjacencies.

Career Highlights

Vanderburg is currently employed at Fujitsu Corporation, where he continues to work on advancements in optical networking technologies. His expertise in this area has positioned him as a valuable asset to his team and the company.

Collaborations

Some of his notable coworkers include Tung Quang Le and James Alvah Spallin. Their collaborative efforts contribute to the innovative projects at Fujitsu Corporation.

Conclusion

Mark Frank Vanderburg's contributions to optical networking through his patented protocol demonstrate his commitment to innovation in technology. His work continues to influence the field and improve network efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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