Canal Fulton, OH, United States of America

Mark F Huston


Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Mark F Huston: Innovator in Metal-Cutting Technology

Introduction

Mark F Huston is a notable inventor based in Canal Fulton, Ohio. He has made significant contributions to the field of metal-cutting technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of metal cutting processes.

Latest Patents

Mark F Huston holds a patent for a chip-controlling insert. This invention, identified as a metal-cutting insert, features a cutting edge and an associated chip control surface. The design allows for effective chip configuration control through a cutting edge formed with a transverse rake face. This rake face extends to the top of the insert above and behind the cutting edge, along with a rearward extending channel that penetrates both the top of the insert and the shelf-type cutting edge. The insert can be ground back to the next rearward disposed shelf, forming a new cutting edge with an associated chip control configuration. Additionally, the rake face can be coated with materials such as titanium nitride, ensuring durability and performance.

Career Highlights

Mark F Huston is currently associated with Manchester Tool Company, where he applies his expertise in metal-cutting technology. His work at the company has allowed him to further develop and refine his innovative ideas. Huston's contributions have been instrumental in advancing the capabilities of metal-cutting tools.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Mark F Huston is a distinguished inventor whose work in metal-cutting technology has led to significant advancements in the industry. His patent for the chip-controlling insert exemplifies his innovative spirit and commitment to improving manufacturing processes.

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