Company Filing History:
Years Active: 2004
Title: Mark F Dionne: Innovator in Optical Signal Methodology
Introduction
Mark F Dionne is a notable inventor based in Burlington, VT (US). He has made significant contributions to the field of device reliability studies through his innovative methodologies. His work primarily focuses on enhancing the testing processes for wafer-level devices.
Latest Patents
Mark F Dionne holds a patent for a groundbreaking methodology and apparatus that utilizes real-time optical signals for wafer-level device dielectrical reliability studies. This patent describes a method and structure that tests devices on a wafer by applying an electrical bias to the devices while simultaneously monitoring the emitted light from all of the devices. The emitted light serves as an indicator of defective devices and records time-based images of the emitted light across the wafer. This innovative approach allows for more efficient identification of defects in semiconductor devices.
Career Highlights
Mark F Dionne is currently employed at International Business Machines Corporation, commonly known as IBM. His role at IBM has allowed him to work on cutting-edge technologies and contribute to advancements in the field of electronics and device reliability.
Collaborations
Throughout his career, Mark has collaborated with several talented individuals, including John M Aitren and Fen Chen. These collaborations have further enriched his work and contributed to the development of innovative solutions in the industry.
Conclusion
Mark F Dionne is a distinguished inventor whose work in optical signal methodologies has made a significant impact on wafer-level device testing. His contributions continue to influence the field of electronics and reliability studies.