Lawrenceville, NJ, United States of America

Mark E Schneider


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1988

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mark E Schneider: Innovator in Semiconductor Technology

Introduction

Mark E Schneider is a notable inventor based in Lawrenceville, NJ (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative designs and patents. His work has had a lasting impact on the industry, showcasing his expertise and dedication to advancing technology.

Latest Patents

One of Mark E Schneider's key patents is related to a power HEMT (High Electron Mobility Transistor) structure. This modulation-doped field effect transistor features a gate recess through a top insulating layer. The design includes a cross-section in a semiconductor layer that increases down to an interface with a further semiconductor layer, followed by a cross-section in the further semiconductor layer that decreases down to the bottom of the recess. A gate electrode is formed within this recess, highlighting the intricate engineering involved in his invention. Mark holds 1 patent for this innovative technology.

Career Highlights

Mark E Schneider is currently employed at Siemens Corporate Research & Support, Inc., where he continues to push the boundaries of semiconductor research and development. His role at Siemens allows him to collaborate with other talented professionals in the field, further enhancing his contributions to technology.

Collaborations

Throughout his career, Mark has worked alongside esteemed colleagues such as Erhard Kohn and Chia-Jen Wu. These collaborations have fostered an environment of innovation and creativity, leading to advancements in semiconductor technology.

Conclusion

Mark E Schneider's work exemplifies the spirit of innovation in the semiconductor industry. His contributions, particularly through his patented technology, continue to influence the field and inspire future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…