Boulder, CO, United States of America

Mark DiLullo


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2016-2019

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4 patents (USPTO):Explore Patents

Title: Mark DiLullo: Innovator in Screen Material Technology

Introduction

Mark DiLullo is a notable inventor based in Boulder, CO (US), recognized for his contributions to screen material technology. With a total of 4 patents to his name, DiLullo has made significant advancements in the field, particularly with his innovative mounting methods.

Latest Patents

One of DiLullo's latest patents is the "Strain relieved mounting method and apparatus for screen material." This invention outlines a method of mounting screen material that includes a screen mounted to a frame at multiple mounting points. An embodiment of this method features mounting patches attached along the perimeter of the screen. These patches are designed to be strain relieved, allowing the screen to be rolled without compromising the in-plane rigidity of the patches when mounted to a frame. Essentially, the strain relieved patches minimize the strain on the screen when it is rolled onto a core. The innovation includes strategically placed notches or slits in the mounting patch to achieve this strain relief.

Career Highlights

DiLullo's career is marked by his dedication to improving screen material applications. His work at Reald Inc. has positioned him as a key player in the industry, where he continues to develop and refine technologies that enhance the functionality and durability of screen materials.

Collaborations

Throughout his career, DiLullo has collaborated with talented individuals such as Harrison Fast and David A. Coleman. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Mark DiLullo's contributions to screen material technology through his patents and collaborative efforts highlight his role as an influential inventor. His innovative approaches continue to shape the industry and inspire future advancements.

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