South Lyon, MI, United States of America

Mark Dennis Bugnell

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Eberspächer North America Inc.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Dennis Bugnell. Retrieved from https://idiyas.com/inventor/mark-dennis-bugnell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Mark Dennis Bugnell: Innovator in Exhaust System Technology

Introduction

Mark Dennis Bugnell is a notable inventor based in South Lyon, MI (US). He has made significant contributions to the field of internal combustion engine technology. His innovative approach has led to the development of a unique mixer for exhaust systems.

Latest Patents

Mark holds 1 patent for his invention titled "Mixer for an exhaust system." This invention is designed to mix a reactant with an exhaust gas flow. The mixer features guide blade portions, fold webs, and spacer webs. The guide blade portions are arranged in pairs, with a first blade portion connected to a second by fold webs. This design allows for efficient mixing of exhaust gases.

Career Highlights

Mark is currently employed at Eberspächer North America Inc., where he continues to innovate in the automotive sector. His work focuses on enhancing the performance and efficiency of exhaust systems in internal combustion engines.

Collaborations

Throughout his career, Mark has collaborated with talented individuals such as John Francis Padalis and Jack Hall Riddle, II. These partnerships have contributed to the advancement of technology in their field.

Conclusion

Mark Dennis Bugnell is a dedicated inventor whose work in exhaust system technology exemplifies innovation and engineering excellence. His contributions continue to impact the automotive industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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