Payneham, Australia

Mark Delaine

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: Smr Patents Sarl, University of South Australia. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark Delaine. Retrieved from https://idiyas.com/inventor/mark-delaine

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2017

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Mark Delaine: Innovator in Coated Polymeric Substrates

Introduction

Mark Delaine is an accomplished inventor based in Payneham, Australia. He has made significant contributions to the field of polymeric substrates, particularly through his innovative patent related to reflective coatings. His work has implications in various industries, showcasing the importance of advancements in material science.

Latest Patents

Mark Delaine holds a patent for "Coated Polymeric Substrates." This invention involves a polymeric substrate that is coated with a reflective coating, specifically a chromium-based reflective coating. This technology has the potential to enhance the performance and efficiency of various applications.

Career Highlights

Throughout his career, Mark has worked with notable organizations, including Smr Patents S.À.r.l. and the University of South Australia. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to the advancement of technology in his field.

Collaborations

Mark has collaborated with talented individuals such as Drew Raymond Evans and Kamil Zuber. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Mark Delaine's contributions to the field of coated polymeric substrates highlight his innovative spirit and dedication to advancing material science. His patent and collaborations reflect a commitment to excellence and the pursuit of new technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…