Wynnewood, PA, United States of America

Mark B Soffa


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 134(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Mark B Soffa: Innovator in Semiconductor Interconnections

Introduction

Mark B Soffa is a notable inventor based in Wynnewood, PA (US). He has made significant contributions to the field of semiconductor devices, particularly in the area of wire interconnections. His innovative approach has led to the development of a unique method that enhances the performance and reliability of electronic components.

Latest Patents

Mark B Soffa holds a patent for a method of making slack-free wire interconnections. This patent addresses the challenges associated with fine wire interconnections used in electrodes and lead-out terminals of semiconductor devices. The method involves several novel steps that ensure the interconnection wire is shaped in a desirable configuration, free of slack. This is achieved by preforming a portion of the wire in a direction opposite to the desired interconnection and subsequently reforming it while maintaining tension in the remainder of the wire.

Career Highlights

Mark B Soffa is associated with Kulicke & Soffa Industries Inc., a company renowned for its advancements in semiconductor packaging and assembly equipment. His work at the company has been instrumental in pushing the boundaries of technology in the semiconductor industry.

Collaborations

Throughout his career, Mark has collaborated with various professionals, including his coworker Zeev Kirshenboin. These collaborations have fostered innovation and have contributed to the development of cutting-edge technologies in the field.

Conclusion

Mark B Soffa's contributions to the semiconductor industry through his innovative methods and patents highlight his role as a key inventor in this field. His work continues to influence the design and manufacturing of electronic devices, ensuring enhanced performance and reliability.

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