Mark A Schimming

Title: Mark A. Schimming: Innovator in Metal Surface Treatment

Introduction

Mark A. Schimming, an inventor based in Saline, MI, has made significant contributions to the field of metalwork through his innovative methods of surface treatment. With a total of three patents to his name, he continues to showcase his ingenuity and commitment to improving industrial processes.

Latest Patents

Among his latest innovations is a method for removing material from the surface of a metal workpiece. This patented process addresses the critical issue of eliminating surface treatments, metal coatings, and other layers that could potentially contaminate nearby welds. One embodiment of this invention features a scraper tool with a body consisting of a base portion and a tab portion, equipped with several scraping elements. During operation, the scraping elements engage with the edge region of the metal workpiece, where the depth of engagement is influenced by the rotation of the tool about a pivot axis. This innovative method greatly enhances the cleanliness and quality of metalwork, making it a valuable addition to industrial practices.

Career Highlights

Mark A. Schimming is associated with Shiloh Industries, Inc., where he applies his expertise in metalworking and innovation. His work has contributed to the company’s reputation for excellence and technological advancement in the manufacturing sector.

Collaborations

Throughout his career, Mark has collaborated with skilled professionals such as Hari Prasad and James F. Keys. These partnerships reflect his commitment to teamwork and the pooling of knowledge to advance engineering solutions in metal surface treatment.

Conclusion

Mark A. Schimming’s contributions to the field of surface treatment for metal workpieces exemplify the innovative spirit necessary for industry progress. With his patents and collaborations, he is paving the way for improved methods in manufacturing, ensuring that quality and efficiency are at the forefront of metalworking practices.