Mark A Leclerc

Title: Innovative Contributions of Mark A. Leclerc in Lithography Technology

Introduction: Mark A. Leclerc, an inventive mind based in Epping, NH, has made significant strides in the field of lithography with his two patented innovations. He is an integral part of Optical Switch Corporation, where he focuses on enhancing interference lithography techniques.

Latest Patents: Mark A. Leclerc holds two noteworthy patents. The first is titled "Period Reconfiguration and Closed Loop Calibration of an Interference Lithography Patterning System and Method of Operation." This invention pertains to a lithographic tool system designed to generate an interferometric pattern of light using multiple exposure beams. The system features a processor connected to a positioning device that generates control signals based on a selected period for the interferometric pattern. This enables precise translation and rotation of exposure beams to achieve optimal lithographic results.

The second patent, "Interference Lithography Using Holey Fibers," presents a method and apparatus that utilize a fiber with axially formed holes surrounding a core. This innovative fiber emits optical signals to perform interference lithography. The design allows for variations in the size and arrangement of the holes, providing fibers that are particularly suited for the reception, communication, and emission of optical signals essential for successful interference lithography applications.

Career Highlights: Throughout his career, Mark A. Leclerc has centered his efforts on advancing lithographic technologies. As a key member of Optical Switch Corporation, he has been involved in pioneering developments that push the boundaries of optical engineering.

Collaborations: Mark has collaborated with talented colleagues such as Adam F. Kelsey and Daniel P. Resler. Together, they have contributed to the innovative environment at Optical Switch Corporation, fostering advancements in their respective fields.

Conclusion: Mark A. Leclerc's contributions to the field of lithography through his patents demonstrate his commitment to innovation and excellence. His work at Optical Switch Corporation not only highlights his expertise but also the importance of collaboration in driving technological advancements. As he continues to refine and develop lithography techniques, Mark remains a significant figure in the realm of optical technologies.