The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
Sep. 19, 2000
Applicant:
Inventors:
Adam F. Kelsey, Waltham, MA (US);
Mark A. Leclerc, Epping, NH (US);
Assignee:
Optical Switch Corporation, Richardson, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/772 ; G03B 2/732 ; G01B 1/100 ; G02B 2/728 ; G03F 9/00 ;
U.S. Cl.
CPC ...
G03B 2/772 ; G03B 2/732 ; G01B 1/100 ; G02B 2/728 ; G03F 9/00 ;
Abstract
A lithographic tool system for generating an interferometric pattern of light using a plurality of exposure beams includes a processor coupled to a positioning device. The processor receives a selected period for the interferometric pattern of light, and generates an angular control signal and a translational control signal in response to the selected period. The positioning device translates an exposure beam in response to the translational control signal, and rotates the exposure beam in response to the angular control signal.