Winter Park, FL, United States of America

Mark A Decker

This inventor holds 1 USPTO granted patent. Top assignee: Lucent Technologies Inc.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mark A Decker. Retrieved from https://idiyas.com/inventor/mark-a-decker-4wqk7mh4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Mark A Decker: Innovator in Ion Implantation Techniques

Introduction

Mark A Decker is a notable inventor based in Winter Park, FL (US). He has made significant contributions to the field of ion implantation, particularly through his innovative methods that enhance the precision of surface measurements.

Latest Patents

Mark A Decker holds a patent for a method titled "Method for controlled implantation of elements into the surface or near surface." This patent describes a technique for introducing a known concentration of ions into a substrate's surface. The method involves applying a removable layer to the surface, followed by ion implantation to achieve a specific concentration of implanted ions at the interface. After the removable layer is taken off, the surface can be analyzed for elemental concentrations using advanced techniques such as total reflection x-ray fluorescence or secondary ion mass spectrometry. This patent showcases his expertise in improving calibration techniques for surface measurements.

Career Highlights

Throughout his career, Mark has been associated with Lucent Technologies Inc., where he has contributed to various projects and innovations. His work has been instrumental in advancing the field of ion implantation and surface analysis.

Collaborations

Mark A Decker has collaborated with notable colleagues, including Ronald F Roberts and Frederick A Stevie. These collaborations have further enriched his research and development efforts in the field.

Conclusion

Mark A Decker's contributions to ion implantation techniques reflect his dedication to innovation and precision in surface measurement. His patent and career achievements highlight his role as a significant figure in the field of materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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